Method of producing hydrogen peroxide using nanostructured bismuth oxide

ABSTRACT

The method of producing hydrogen peroxide using nanostructured bismuth oxide is an electrochemical process for producing hydrogen peroxide using a cathode formed as oxygen-deficient nanostructured bismuth oxide deposited as a film on the surface of a conducting substrate. An anode and the cathode are immersed in an alkaline solution saturated with oxygen in an electrolytic cell. An electrical potential is established across the cathode and the anode to initiate electrochemical reduction of the oxygen in the alkaline solution to produce hydrogen peroxide by oxygen reduction reaction.

BACKGROUND 1. Field

The disclosure of the present patent application relates to the production of hydrogen peroxide, and particularly to a method of producing hydrogen peroxide using nanostructured bismuth oxide by electrochemical reduction of oxygen using an electrode comprising a dendritic nanostructured bismuth oxide (Bi₂O_(3-x)).

2. Description of the Related Art

Hydrogen peroxide (H₂O₂) is an essential chemical feedstock for chemical industries, medicine and environmental remediation, as well as supplying an oxidant in renewable energy conversion applications and in storage devices. Due to its powerful oxidizing nature, H₂O₂ is also used in water treatment and as an energy carrier in many chemical processes without generating toxic by-products. At present, the industrial production of high-purity H₂O₂ solution typically relies on an anthraquinone method (i.e., the Riedl-Pfleiderer process), which involves the use of toxic solvents and requires high energy consumption. Transport, handling, and storage of concentrated H₂O₂ produced by the method raises further safety concerns. Therefore, an effective in situ H₂O₂ production technology is desirable.

H₂O₂ may be directly generated electrochemically by oxygen reduction reaction (ORR). ORR in aqueous solutions occurs primarily through two pathways, the direct 4-electron reduction pathway from O₂ to H₂O, and the 2-electron reduction pathway from O₂ to hydrogen peroxide (H₂O₂). Non-precious metal electrocatalysts with high selectivity for the electrocatalytic reduction of O₂ to H₂O₂ are desired for the establishment of green and sustainable chemistry. Bismuth oxide (Bi₂O₃) is a p-type semiconductor material with potential as an efficient ORR electrocatalyst due to its low conductivity and reactivity. The effect of oxygen vacancies induced in Bi₂O₃, i.e., Bi₂O_(3-x), on electrochemical generation of H₂O₂ is not known or predicted.

Thus, a method of producing hydrogen peroxide using nanostructured bismuth oxide solving the aforementioned problems is desired.

SUMMARY

The method of producing hydrogen peroxide using nanostructured bismuth oxide as described herein is an electrochemical approach for producing hydrogen peroxide using a cathode formed as a nanostructured dendritic (ND) oxygen-deficient bismuth oxide (Bi₂O_(3-x)) electrode surface. Bi₂O_(3-x) dendritic nanostructures may be grown on a conducting substrate, for example, by first depositing a bismuth film on the substrate, annealing the bismuth film in air to convert the bismuth film to a film of bismuth oxide (Bi₂O₃), and then annealing the bismuth oxide film under vacuum to create oxygen vacancies (Bi₂O_(3-x)). The deposition step may be electrodeposition. The conducting substrate may be a transparent conducting substrate, such as fluorine-doped tin oxide (FTO). In use, an anode and the cathode prepared in this manner may be immersed in an alkaline medium saturated with oxygen in an electrochemical cell to produce hydrogen peroxide by oxygen reduction reaction.

These and other features of the present subject matter will become readily apparent upon further review of the following specification and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a Field Emission Scanning Electron Microscopy (FESEM) micrograph top view of bismuth film electrodeposited on a fluorine-doped tin oxide (FTO) substrate as a first step in forming an electrode.

FIG. 1B is a FESEM micrograph side view of bismuth electrodeposited on an FTO substrate.

FIG. 1C is a FESEM micrograph of the electrode of FIG. 1A after annealing the electrode in air to convert the bismuth to Bi₂O₃.

FIG. 1D is an Energy Dispersive Spectrographic (EDS) spectrum of the Bi₂O₃ deposited on the electrode of FIG. 1C.

FIG. 1E is a FESEM micrograph of the electrode of FIG. 1C after subsequently annealing the electrode under vacuum to form an oxygen deficient Bi₂O_(3-x)/FTO electrode.

FIG. 1F is an EDS spectrum of the oxygen deficient Bi₂O_(3-x) deposited on the electrode of FIG. 1E.

FIG. 2 is a composite X-ray powder diffraction (XRD) diffractogram comparing patterns for Bi nanostructured dendritic (ND) film, Bi₂O₃ ND and Bi₂O_(3-x) ND on FTO substrates.

FIG. 3 is a composite cyclic voltammetry (CV) voltammogram comparing traces of Bi₂O₃ ND/FTO electrodes (without being annealed under vacuum) with Bi₂O_(3-x) ND/FTO electrodes (rendered oxygen deficient by annealing under vacuum) in alkaline solution.

FIG. 4 is a composite linear sweep voltammetry (LSV) voltammogram comparing traces of Bi₂O₃ ND/FTO electrodes, Bi₂O_(3-x) ND/FTO electrodes, and Pt (20%)/C electrodes in alkaline solution.

FIG. 5A is a composite LSV voltammogram comparing traces taken with a Bi₂O₃ ND/FTO electrode in alkaline solution where the solution was purged for 20 min with either pure nitrogen (N₂), air or pure oxygen (O₂).

FIG. 5B is a composite LSV voltammogram comparing traces taken with a Bi₂O_(3-x)ND/FTO electrode in alkaline solution where the solution was purged for 20 min with either pure nitrogen (N₂), air, or pure oxygen (O₂).

FIG. 5C is a composite LSV voltammogram comparing a trace taken with a Bi₂O₃ ND/FTO electrode in alkaline solution saturated with oxygen to a trace taken with a Bi₂O_(3-x) ND/FTO electrode in alkaline solution saturated with oxygen.

FIG. 6A is a composite CV voltammogram taken in alkaline solution comparing a CV trace of a Bi₂O₃ ND/FTO electrode before addition of H₂O₂ with a CV trace of a Bi₂O₃ ND/FTO electrode after addition of 0.4M H₂O₂ (30%).

FIG. 6B is a composite CV voltammogram taken in alkaline solution comparing a CV trace of a Bi₂O_(3-x) ND/FTO electrode before addition of H₂O₂ with a CV trace of a Bi₂O_(3-x)ND/FTO electrode after addition of 0.4M H₂O₂ (30%).

FIG. 7A is a composite CV voltammogram taken in alkaline solution comparing CV traces made upon sequential additions of M aliquots of H₂O₂ to the solution.

FIG. 7B is a plot of peak current as a function of H₂O₂ content/concentration based upon the traces in FIG. 7A.

FIG. 7C is a composite CV voltammogram taken in alkaline solution comparing CV traces made upon sequential additions of mM aliquots of H₂O₂ to the solution.

FIG. 7D is a plot of peak current as a function of H₂O₂ content/concentration based upon the traces in FIG. 7C.

FIG. 8A is a composite LSV voltammogram comparing LSV traces taken at different scan rates for a Bi₂O_(3-x) ND/FTO electrode in oxygen saturated alkaline solution.

FIG. 8B is a plot of peak currents as a function of the square root of the scan rate for the traces in FIG. 8A.

Similar reference characters denote corresponding features consistently throughout the attached drawings.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The method of producing hydrogen peroxide using nanostructured bismuth oxide is an electrochemical method for producing and sensing hydrogen peroxide using a cathode formed as a nanostructured dendritic (ND) oxygen-deficient bismuth oxide (Bi₂O_(3-x)) electrode. The cathode is formed by depositing a bismuth film on a conducting substrate using an electrodeposition method, followed by annealing the bismuth film in air to oxidize bismuth to form a film of bismuth oxide (Bi₂O₃), and then annealing the bismuth oxide film under vacuum to partially reduce the bismuth oxide to form an oxygen-deficient reduced bismuth oxide (Bi₂O_(3-x), where x is greater than 0 and less than 3) surface on the electrode. The cathode prepared in this manner and an anode are immersed in an alkaline medium saturated with oxygen to form an electrochemical cell for the production of H₂O₂.

Oxygen deficient nanodendrite Bi₂O_(3-x) electrodes were controllably prepared through electrodeposition of bismuth on FTO as an exemplary conductive substrate, followed by heat treatment in air to oxidize the bismuth and form bismuth oxide (Bi₂O₃), and then by annealing again under vacuum to create oxygen deficiency and reduce the bismuth oxide. Such electrodes will hereto for be referred to as Bi₂O_(3-x) ND/FTO electrodes. The effect of annealing gases on the surface chemistry of Bi₂O_(3-x) ND/FTO electrodes was examined by cyclic voltammetry (CV) and by scanning electron microscopy (SEM), and compared with Bi₂O₃ ND/FTO and conventional electrodes, with results shown in the drawings. The overvoltage to perform ORR by cyclic polarization using the exemplary fabricated Bi₂O_(3-x) ND/FTO electrodes is considerably reduced relative to when using the exemplary Bi₂O₃ ND/FTO electrodes. The exemplary Bi₂O_(3-x) ND/FTO electrodes result in efficient production of H₂O₂ at low overpotential.

The following details the particular materials and methods used in the exemplary implementation of the method. Bismuth (III) nitrate (Bi(NO₃)₃.5H₂O, ≥98.0%) and ethylene glycol (EG; HOCH₂CH₂OH, ≥99.8%) were acquired from Fisher Scientific. All chemicals were used as is. Electrodeposition was carried out in a one compartment cell via a VMP2 multichannel potentiostat system. A classical 3-electrode system comprising a fluoride-doped tin oxide (FTO) working electrode, an Ag/AgCl (4 M KCl) reference electrode, and a Pt counter electrode was used. Bi-metallic films were prepared starting with a 20 mM Bi(NO₃)₃.5H₂O solution in EG. The electrodeposition was performed by passing 0.1 C/cm² at E=−1.8 V vs. Ag/AgCl, then resting for 2 s. The cycle was repeated 5 times to pass a total charge of 0.50 C/cm². The electrodeposited Bi-metallic films were annealed at 450° C. for 2 h in air after ramping to the target temperature of 450° C. at a ramping rate of 3.0° C./min to form Bi₂O₃ films. The Bi₂O₃ films were placed in a porcelain combustion boat and maintained at 350° C. for various times (0.5 to 5.0 h) under vacuum to obtain Bi₂O_(3-x) films.

The fabricated materials were allowed to cool to room temperature under vacuum. The morphology of the electrodes was examined using FESEM (JSM-6380LA). Ultraviolet-visible diffuse reflectance spectroscopy (UV-DRS) measurements were performed using a Hitachi U-3010. The crystallinity and purity of exemplary electrodes fabricated as described herein were investigated by X-ray diffraction (XRD) on a Bruker D8-Advance Diffractometer via Cu Ka radiation (λ=1.5418 Å).

The theoretical value of the Levich slope (B) is evaluated from the following equation: B=0:62×n×F×C _(O2) ×D _(O2) ^(2/3)×ν^(−1/6) where n is the electron transfer number in ORR, F is the Faradic constant (96,485 C mol⁻¹), C_(O2) is the saturated oxygen concentration in 0.1M NaOH aqueous solution (1.2×10⁻⁶ mol cm⁻³), D_(O2) is the oxygen diffusion coefficient (1.73×10⁻⁵ cm² s⁻¹) and ν is the kinematic viscosity of the solution (0.01 cm² s⁻¹).

The structure and morphology of the Bi-metallic film, Bi₂O₃ film, and Bi₂O_(3-x) film during the electrophoretic deposition and annealing processes in the fabrication of Bi₂O_(3-x) ND/FTO were characterized by SEM. FIG. 1A shows FESEM images of the Bi-metallic dendritic nanostructures electrodeposited (charge: 0.5 C cm⁻²) on an FTO substrate. The FESEM images show that nano-aggregates of deposited Bi form randomly arranged nanodendrites with a micro-nano hierarchical structure (see also FIG. 1B) suitable for electrochemical applications. Dendrites in the range of 1-2 μm in length feature many nano-scaled dendrite side branches less than 200 nm in length. Bi ND/FTO electrodes are converted to Bi₂O₃ ND/FTO by annealing in air, as described previously, the resulting nanostructures being shown in FIG. 1C and further characterized by EDS analysis, as shown in FIG. 1D. After air annealing, the main branches appear to increase in length and the side branches exhibit more defined, leaf-like morphologies. In other words, well-defined nanodendrites are formed in the process of forming the Bi₂O₃ film. The FESEM image of a Bi₂O_(3-x) ND/FTO electrode shows no significant changes occur in morphology during vacuum annealing, as shown in FIG. 1E. The corresponding EDS analysis is provided in FIG. 1F.

The XRD diffractogram patterns of the Bi ND, Bi₂O₃ ND and Bi₂O_(3-x) ND films are shown in FIG. 2. The 2θ values may be compared with standard values to identify crystalline structures in the material. The diffraction peaks observed in Bi₂O₃ ND and Bi₂O_(3-x)ND match well with the standard JCPDS card number 27-0050 of β-Bi₂O₃, which crystallizes in a tetragonal system. The diffraction peaks of the Bi₂O₃ ND and Bi₂O_(3-x) ND samples can be indexed well to corresponding single phases, which crystallize in a tetragonal β-Bi₂O₃ system (JCPDS No. 27-0050). The sharp diffraction peaks of Bi₂O₃ ND and Bi₂O_(3-x) ND indicate that each exhibits high crystallinity. However, in the case of Bi₂O_(3-x) ND, the diffraction peaks become much broader and weaker, which indicates its reduced crystallinity relative to the Bi₂O₃ ND.

The electrochemical activity of Bi₂O₃ ND and Bi₂O_(3-x) ND electrodes was further examined for application as catalysts in ORRs performed in O₂-saturated alkaline solution. For the Bi₂O_(3-x) ND, annealing under vacuum was performed at 350° C. for 120 min. FIG. 3 shows the results of cyclic voltammograms (CVs) for each of the exemplary electrodes performed at 50 mV s⁻¹ in 0.1 M NaOH. In the presence of O₂, the Bi₂O₃ ND electrode displays a low current plateau in the potential window from 0.2 to 1.5 V vs. RHE (reversible hydrogen electrode, used to calibrate the reference electrode). Further, the Bi₂O₃ ND electrode does not show any reduction peak in the measured potential region. In contrast, the Bi₂O_(3-x) ND electrode show well-defined reduction peaks at 0.45 V vs RHE. The Bi₂O_(3-x) ND electrode exhibits well-defined high redox peak currents, indicating greater electrochemical reversibility than the Bi₂O₃ ND electrode. The peak-to-peak separation for the Bi₂O_(3-x) ND electrode is estimated to be 0.75 V. In comparison to Bi₂O₃ ND electrodes, oxygen deficient Bi₂O_(3-x) ND electrodes produced by vacuum annealing of Bi₂O₃ ND show considerably enhanced electronic conductivity and reactivity in the ORR process. This could possibly, but without being bound by theory, be due to the large number of oxygen defects created, which provide oxygen vacancies that could serve as acceptors, resulting in semiconducting activity, thereby facilitating reactant adsorption and charge transfer.

During ORR, linear sweep voltammogram (LSV) measurements were carried out for the Bi₂O₃ ND electrode and the Bi₂O_(3-x) ND electrode, in comparison with state of the art Pt/C catalysts. Results of these measurements are presented in FIG. 4. FIG. 4 illustrates that the oxygen deficient Bi₂O_(3-x) ND electrodes provide significantly more electrocatalytic activity compared to Bi₂O₃ ND (but lower than Pt/C catalysts in the alkaline electrolyte), demonstrated by the more positive onset and half-wave potentials. Additionally, the different electrocatalytic behavior observed with Bi₂O_(3-x) ND/FTO and Bi₂O₃ ND/FTO electrodes during ORR indicates that more active ORR sites are available on the Bi₂O_(3-x) ND/FTO electrodes, possibly due to the available oxygen vacancies.

The oxygen reduction potentials are more positive for the Bi₂O_(3-x) ND electrode relative to the Bi₂O₃ ND and Pt/C electrodes, which suggests enhanced catalytic performance towards ORR.

To confirm the identity for the oxygen reduction peaks at the Bi₂O₃ ND and Bi₂O_(3-x) ND electrodes, the effect of oxygen concentration in alkaline media was examined by purging the medium with one of O₂, air or N₂. FIGS. 5A-5C show the CV traces taken at exemplary a Bi₂O₃ ND and Bi₂O_(3-x) ND electrodes in the different oxygen concentrations in 0.1 M NaOH. The CV for the Bi₂O_(3-x) ND electrodes in deoxygenated (N₂) solution (FIG. 5A) shows no reduction peak in the measured region. The CV for the Bi₂O_(3-x) ND electrodes in moderate oxygen conditions (electrolyte solution purged with air, FIG. 5B) exhibits oxygen reduction peaks, and in high oxygen conditions (electrolyte purged with O₂, FIG. 5C) shows further increased electrocatalytic current. Finally, these results suggest the observed peaks are due to the reduction of oxygen at Bi₂O_(3-x) ND electrodes, and we speculate that the reduction process at potential 0.46 V vs RHE, which corresponds to the reduction of O₂ by two electrons to give H₂O₂ (or more correctly HO₂ ⁻). Comparing the CV curves of Bi₂O_(3-x) ND electrodes and Bi₂O₃ ND electrodes, it appears that electrocatalytic reduction of oxygen on the electrode is more effective in the Bi₂O_(3-x) system, which provides greater cathodic current than Bi₂O₃ ND in 0.1 M NaOH aqueous electrolyte. In comparison with the Bi₂O₃ ND electrode, the increase of current response of Bi₂O_(3-x) suggests that generated oxygen vacancies play a main part in the electrochemical production of H₂O₂.

To determine the electrochemical response to H₂O₂, CV was performed in the absence and presence of 0.4 M H₂O₂, where Bi₂O₃ and Bi₂O_(3-x) electrodes were compared and are demonstrated in FIGS. 6A-6B. FIG. 6A shows the CVs with addition of 0.4 M H₂O₂ aliquots into 0.1 M NaOH solution at Bi₂O₃ ND electrode. The Bi₂O₃ ND electrode shows nearly no reduction behavior, demonstrating that the reduction of H₂O₂ was hardly attained at this electrode. In contrast, the Bi₂O_(3-x) ND electrode displays much greater response signals with much greater catalytic current and lowers the over potential value, as shown in FIG. 6B. This result clearly indicates that the oxygen deficient nature of Bi₂O_(3-x) plays a critical role in H₂O₂ reduction behavior.

FIG. 7A displays CVs taken with sequential addition of H₂O₂ aliquots in the range of 0-40 μM into 0.1 M NaOH solution at Bi₂O_(3-x) ND electrodes. In N₂ saturated 0.1 M NaOH, the reduction peak current of H₂O₂ increases gradually following the addition of H₂O₂ concentration. As shown in FIG. 7B, there is a good linear relationship between the peak current and H₂O₂ concentration in the range of 0˜40 μM (R=0.9957). FIG. 7C displays CVs taken with sequential addition of H₂O₂ aliquots in the range of 0-100 mM into 0.1 M NaOH solution at Bi₂O_(3-x) electrodes. FIG. 7D displays a good linear relationship between the peak current and H₂O₂ concentration at the range of 0˜100 mM (R=0.984). Upon the continued addition of H₂O₂, remarkable current increase at the oxidation peak is observed, confirming the exceptional oxidizing effect of Bi₂O_(3-x) toward H₂O₂. In addition, the oxidation potential exhibits a slight positive shift, potentially signifying a kinetic limitation of the H₂O₂ oxidation reaction.

FIG. 8A displays the influence of the scan rate on the ORR process at Bi₂O_(3-x) ND electrodes in 0.1 M NaOH saturated with O₂. Further, the association between the cathodic current and the square root of the scan rate is shown in FIG. 8B. For Bi₂O_(3-x) ND electrodes, both oxygen reduction peak currents increase linearly with the square root of potential scan rate, signifying that the overall ORR process at this electrode is dominated by the diffusion of O₂ from solution to the oxygen vacancies at surface sites. Moreover, with increased H₂O₂ concentration, the reduction peak currents shifted toward more negative potentials, suggesting a possible kinetic limitation in the reaction between Bi₂O_(3-x) ND/FTO and H₂O₂.

The Bi₂O_(3-x) ND electrodes allow for production of H₂O₂ at low overpotentials. Annealing of metal oxides under vacuum is a simple, scalable and low cost way of creating oxygen vacancies to create highly efficient catalysts for H₂O₂ generation.

It is to be understood that the method of producing hydrogen peroxide using nanostructured bismuth oxide are not limited to the specific embodiments described above, but encompasses any and all embodiments within the scope of the generic language of the following claims enabled by the embodiments described herein, or otherwise shown in the drawings or described above in terms sufficient to enable one of ordinary skill in the art to make and use the claimed subject matter. 

We claim:
 1. A method of making an electrode for electrochemical production of hydrogen peroxide, comprising the steps of: electrodepositing a film of bismuth on a substrate, the substrate having a surface; annealing the film of bismuth in air, thereby oxidizing the bismuth to form a film of bismuth oxide (Bi₂O₃) on the surface of the substrate; and annealing the film of bismuth oxide under vacuum, thereby reducing the bismuth oxide to form a film of oxygen-deficient bismuth oxide of formula Bi₂O_(3-x) on the surface of the substrate, wherein x is greater than 0 and less than
 3. 2. The method of making an electrode according to claim 1, wherein said substrate comprises fluorine-doped tin oxide.
 3. The method of making an electrode according to claim 1, wherein said step of annealing the film of bismuth in air comprises heating the bismuth film deposited on the substrate at 450° C. in air.
 4. The method of making an electrode according to claim 3, wherein said step of annealing the film of bismuth in air comprises heating the bismuth film deposited on the substrate at 450° C. in air for two hours.
 5. The method of making an electrode according to claim 1, wherein said step of annealing the film of bismuth oxide under vacuum comprises heating the bismuth oxide film deposited on the substrate at 350° C. under vacuum.
 6. The method of making an electrode according to claim 4, wherein said step of annealing the film of bismuth oxide under vacuum comprises heating the bismuth oxide film deposited on the substrate at 350° C. under vacuum for between 0.5 and 5 hours. 